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A Study on the Sub-5 nm Nano-Step Height Reference Materials Fabricated by Atomic Layer Deposition Combined with Wet Etching
Nano-steps, as classical nano-geometric reference materials, are very important for calibrating measurements in the semiconductor industry; therefore, controlling the height of nano-steps is critical for ensuring accurate measurements. Accordingly, in this study nano-steps with heights of 1, 2, 3 an...
Autores principales: | Wang, Chenying, Li, Lei, Jing, Weixuan, Zhang, Yaxin, Wang, Song, Lin, Qijing, Xian, Dan, Mao, Qi, Zhang, Yijun, Duan, Duanzhi, Liu, Ming, Jiang, Zhuangde |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
MDPI
2022
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9506470/ https://www.ncbi.nlm.nih.gov/pubmed/36144077 http://dx.doi.org/10.3390/mi13091454 |
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