Atmospheric pressure atomic layer deposition to increase organic solvent resistance of PDMS

We explore three variants of atomic layer deposition (ALD) to deposit titanium oxide on the soft polymer polydimethylsiloxane (PDMS). We show that the organic solvent resistance of PDMS is increased by two orders of magnitude compared to uncoated PDMS for ALD performed at atmospheric pressure, which...

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Detalles Bibliográficos
Autores principales: Santoso, Albert, Damen, Afke, van Ommen, J. Ruud, van Steijn, Volkert
Formato: Online Artículo Texto
Lenguaje:English
Publicado: The Royal Society of Chemistry 2022
Materias:
Chemistry
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9514010/
https://www.ncbi.nlm.nih.gov/pubmed/36073302
http://dx.doi.org/10.1039/d2cc02402k

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9514010/
https://www.ncbi.nlm.nih.gov/pubmed/36073302
http://dx.doi.org/10.1039/d2cc02402k

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