Atmospheric pressure atomic layer deposition to increase organic solvent resistance of PDMS

We explore three variants of atomic layer deposition (ALD) to deposit titanium oxide on the soft polymer polydimethylsiloxane (PDMS). We show that the organic solvent resistance of PDMS is increased by two orders of magnitude compared to uncoated PDMS for ALD performed at atmospheric pressure, which...

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Detalles Bibliográficos
Autores principales: Santoso, Albert, Damen, Afke, van Ommen, J. Ruud, van Steijn, Volkert
Formato: Online Artículo Texto
Lenguaje:English
Publicado: The Royal Society of Chemistry 2022
Materias:
Chemistry
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9514010/
https://www.ncbi.nlm.nih.gov/pubmed/36073302
http://dx.doi.org/10.1039/d2cc02402k
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author Santoso, Albert
Damen, Afke
van Ommen, J. Ruud
van Steijn, Volkert
author_facet Santoso, Albert
Damen, Afke
van Ommen, J. Ruud
van Steijn, Volkert
author_sort Santoso, Albert
collection PubMed
description We explore three variants of atomic layer deposition (ALD) to deposit titanium oxide on the soft polymer polydimethylsiloxane (PDMS). We show that the organic solvent resistance of PDMS is increased by two orders of magnitude compared to uncoated PDMS for ALD performed at atmospheric pressure, which results in a unique surface–subsurface coating of PDMS.
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spelling pubmed-95140102022-10-21 Atmospheric pressure atomic layer deposition to increase organic solvent resistance of PDMS Santoso, Albert Damen, Afke van Ommen, J. Ruud van Steijn, Volkert Chem Commun (Camb) Chemistry We explore three variants of atomic layer deposition (ALD) to deposit titanium oxide on the soft polymer polydimethylsiloxane (PDMS). We show that the organic solvent resistance of PDMS is increased by two orders of magnitude compared to uncoated PDMS for ALD performed at atmospheric pressure, which results in a unique surface–subsurface coating of PDMS. The Royal Society of Chemistry 2022-08-11 /pmc/articles/PMC9514010/ /pubmed/36073302 http://dx.doi.org/10.1039/d2cc02402k Text en This journal is © The Royal Society of Chemistry https://creativecommons.org/licenses/by-nc/3.0/
spellingShingle Chemistry
Santoso, Albert
Damen, Afke
van Ommen, J. Ruud
van Steijn, Volkert
Atmospheric pressure atomic layer deposition to increase organic solvent resistance of PDMS
title Atmospheric pressure atomic layer deposition to increase organic solvent resistance of PDMS
title_full Atmospheric pressure atomic layer deposition to increase organic solvent resistance of PDMS
title_fullStr Atmospheric pressure atomic layer deposition to increase organic solvent resistance of PDMS
title_full_unstemmed Atmospheric pressure atomic layer deposition to increase organic solvent resistance of PDMS
title_short Atmospheric pressure atomic layer deposition to increase organic solvent resistance of PDMS
title_sort atmospheric pressure atomic layer deposition to increase organic solvent resistance of pdms
topic Chemistry
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9514010/
https://www.ncbi.nlm.nih.gov/pubmed/36073302
http://dx.doi.org/10.1039/d2cc02402k
work_keys_str_mv AT santosoalbert atmosphericpressureatomiclayerdepositiontoincreaseorganicsolventresistanceofpdms
AT damenafke atmosphericpressureatomiclayerdepositiontoincreaseorganicsolventresistanceofpdms
AT vanommenjruud atmosphericpressureatomiclayerdepositiontoincreaseorganicsolventresistanceofpdms
AT vansteijnvolkert atmosphericpressureatomiclayerdepositiontoincreaseorganicsolventresistanceofpdms

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