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Reliable metal–graphene contact formation process flows in a CMOS-compatible environment
The possibility of exploiting the enormous potential of graphene for microelectronics and photonics must go through the optimization of the graphene–metal contact. Achieving low contact resistance is essential for the consideration of graphene as a candidate material for electronic and photonic devi...
| Autores principales: | , , , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
RSC
2022
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9552920/ https://www.ncbi.nlm.nih.gov/pubmed/36321140 http://dx.doi.org/10.1039/d2na00351a |