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Reliable metal–graphene contact formation process flows in a CMOS-compatible environment

The possibility of exploiting the enormous potential of graphene for microelectronics and photonics must go through the optimization of the graphene–metal contact. Achieving low contact resistance is essential for the consideration of graphene as a candidate material for electronic and photonic devi...

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Detalles Bibliográficos
Autores principales:	Elviretti, M., Lisker, M., Lukose, R., Lukosius, M., Akhtar, F., Mai, A.
Formato:	Online Artículo Texto
Lenguaje:	English
Publicado:	RSC 2022
Materias:	Chemistry
Acceso en línea:	https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9552920/ https://www.ncbi.nlm.nih.gov/pubmed/36321140 http://dx.doi.org/10.1039/d2na00351a

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