Wafer-scale MoS(2) with water-vapor assisted showerhead MOCVD

Among numerous thin film synthesis methods, metalorganic chemical vapor deposition performed in a showerhead reactor is the most promising one for broad use in scalable and commercially adaptable two-dimensional material synthesis processes. Adapting the most efficient monolayer growth methodologies...

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Detalles Bibliográficos
Autores principales: Macha, Michal, Ji, Hyun Goo, Tripathi, Mukesh, Zhao, Yanfei, Thakur, Mukeshchand, Zhang, Jing, Kis, Andras, Radenovic, Aleksandra
Formato: Online Artículo Texto
Lenguaje:English
Publicado: RSC 2022
Materias:
Chemistry
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9552924/
https://www.ncbi.nlm.nih.gov/pubmed/36321146
http://dx.doi.org/10.1039/d2na00409g

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9552924/
https://www.ncbi.nlm.nih.gov/pubmed/36321146
http://dx.doi.org/10.1039/d2na00409g

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