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Wafer-scale MoS(2) with water-vapor assisted showerhead MOCVD

Among numerous thin film synthesis methods, metalorganic chemical vapor deposition performed in a showerhead reactor is the most promising one for broad use in scalable and commercially adaptable two-dimensional material synthesis processes. Adapting the most efficient monolayer growth methodologies...

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Autores principales: Macha, Michal, Ji, Hyun Goo, Tripathi, Mukesh, Zhao, Yanfei, Thakur, Mukeshchand, Zhang, Jing, Kis, Andras, Radenovic, Aleksandra
Formato: Online Artículo Texto
Lenguaje:English
Publicado: RSC 2022
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9552924/
https://www.ncbi.nlm.nih.gov/pubmed/36321146
http://dx.doi.org/10.1039/d2na00409g
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author Macha, Michal
Ji, Hyun Goo
Tripathi, Mukesh
Zhao, Yanfei
Thakur, Mukeshchand
Zhang, Jing
Kis, Andras
Radenovic, Aleksandra
author_facet Macha, Michal
Ji, Hyun Goo
Tripathi, Mukesh
Zhao, Yanfei
Thakur, Mukeshchand
Zhang, Jing
Kis, Andras
Radenovic, Aleksandra
author_sort Macha, Michal
collection PubMed
description Among numerous thin film synthesis methods, metalorganic chemical vapor deposition performed in a showerhead reactor is the most promising one for broad use in scalable and commercially adaptable two-dimensional material synthesis processes. Adapting the most efficient monolayer growth methodologies from tube-furnace systems to vertical-showerhead geometries allows us to overcome the intrinsic process limitations and improve the overall monolayer yield quality. Here, we demonstrate large-area, monolayer molybdenum disulphide growth by combining gas-phase precursor supply with unique tube-furnace approaches of utilizing sodium molybdate pre-seeding solution spincoated on a substrate along with water vapor added during the growth step. The engineered process yields a high-quality, 4-inch scale monolayer film on sapphire wafers. The monolayer growth coverage, average crystal size and defect density were evaluated using Raman and photoluminescence spectroscopy, X-ray photoelectron spectroscopy, scanning electron microscopy and scanning transmission electron microscopy imaging. Our findings provide a direct step forward toward developing a reproducible and large-scale MoS(2) synthesis with commercial showerhead reactors.
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spelling pubmed-95529242022-10-31 Wafer-scale MoS(2) with water-vapor assisted showerhead MOCVD Macha, Michal Ji, Hyun Goo Tripathi, Mukesh Zhao, Yanfei Thakur, Mukeshchand Zhang, Jing Kis, Andras Radenovic, Aleksandra Nanoscale Adv Chemistry Among numerous thin film synthesis methods, metalorganic chemical vapor deposition performed in a showerhead reactor is the most promising one for broad use in scalable and commercially adaptable two-dimensional material synthesis processes. Adapting the most efficient monolayer growth methodologies from tube-furnace systems to vertical-showerhead geometries allows us to overcome the intrinsic process limitations and improve the overall monolayer yield quality. Here, we demonstrate large-area, monolayer molybdenum disulphide growth by combining gas-phase precursor supply with unique tube-furnace approaches of utilizing sodium molybdate pre-seeding solution spincoated on a substrate along with water vapor added during the growth step. The engineered process yields a high-quality, 4-inch scale monolayer film on sapphire wafers. The monolayer growth coverage, average crystal size and defect density were evaluated using Raman and photoluminescence spectroscopy, X-ray photoelectron spectroscopy, scanning electron microscopy and scanning transmission electron microscopy imaging. Our findings provide a direct step forward toward developing a reproducible and large-scale MoS(2) synthesis with commercial showerhead reactors. RSC 2022-09-02 /pmc/articles/PMC9552924/ /pubmed/36321146 http://dx.doi.org/10.1039/d2na00409g Text en This journal is © The Royal Society of Chemistry https://creativecommons.org/licenses/by-nc/3.0/
spellingShingle Chemistry
Macha, Michal
Ji, Hyun Goo
Tripathi, Mukesh
Zhao, Yanfei
Thakur, Mukeshchand
Zhang, Jing
Kis, Andras
Radenovic, Aleksandra
Wafer-scale MoS(2) with water-vapor assisted showerhead MOCVD
title Wafer-scale MoS(2) with water-vapor assisted showerhead MOCVD
title_full Wafer-scale MoS(2) with water-vapor assisted showerhead MOCVD
title_fullStr Wafer-scale MoS(2) with water-vapor assisted showerhead MOCVD
title_full_unstemmed Wafer-scale MoS(2) with water-vapor assisted showerhead MOCVD
title_short Wafer-scale MoS(2) with water-vapor assisted showerhead MOCVD
title_sort wafer-scale mos(2) with water-vapor assisted showerhead mocvd
topic Chemistry
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9552924/
https://www.ncbi.nlm.nih.gov/pubmed/36321146
http://dx.doi.org/10.1039/d2na00409g
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