Metronidazole Degradation by UV and UV/H(2)O(2) Advanced Oxidation Processes: Kinetics, Mechanisms, and Effects of Natural Water Matrices

Advanced oxidation technology represented by hydroxyl radicals has great potential to remove residual antibiotics. In this study, we systematically compared the metronidazole (MTZ) degradation behavior and mechanism in the UV and UV/H(2)O(2) systems at pH 3.00 condition. The results show that the in...

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Detalles Bibliográficos
Autores principales: Su, Rongkui, Dai, Xiangrong, Wang, Hanqing, Wang, Zhixiang, Li, Zishi, Chen, Yonghua, Luo, Yiting, Ouyang, Danxia
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2022
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9565145/
https://www.ncbi.nlm.nih.gov/pubmed/36231654
http://dx.doi.org/10.3390/ijerph191912354

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9565145/
https://www.ncbi.nlm.nih.gov/pubmed/36231654
http://dx.doi.org/10.3390/ijerph191912354

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