Investigation of Morphological, Optical, and Dielectric Properties of RF Sputtered WO(x) Thin Films for Optoelectronic Applications

Tungsten oxide (WO(x)) thin films were synthesized through the RF magnetron sputtering method by varying the sputtering power from 30 W to 80 W. Different investigations have been conducted to evaluate the variation in different morphological, optical, and dielectric properties with the sputtering p...

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Detalles Bibliográficos
Autores principales: Mahjabin, Samiya, Haque, Md. Mahfuzul, Sobayel, K., Selvanathan, Vidhya, Jamal, M. S., Bashar, M. S., Sultana, Munira, Hossain, Mohammad Ismail, Shahiduzzaman, Md., Algethami, Merfat, Alharthi, Sami S., Amin, Nowshad, Sopian, Kamaruzzaman, Akhtaruzzaman, Md.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2022
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9565653/
https://www.ncbi.nlm.nih.gov/pubmed/36234594
http://dx.doi.org/10.3390/nano12193467

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9565653/
https://www.ncbi.nlm.nih.gov/pubmed/36234594
http://dx.doi.org/10.3390/nano12193467

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