Versatile Approach of Silicon Nanofabrication without Resists: Helium Ion-Bombardment Enhanced Etching

Herein, we report a helium ion-bombardment enhanced etching method for silicon nanofabrication without the use of resists; furthermore, we demonstrate its unique advantages for straightforward fabrication on irregular surfaces and prototyping nano-electro-mechanical system devices, such as self-encl...

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Detalles Bibliográficos
Autores principales: Wen, Xiaolei, Zhang, Lansheng, Tian, Feng, Xu, Yang, Hu, Huan
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2022
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9565762/
https://www.ncbi.nlm.nih.gov/pubmed/36234396
http://dx.doi.org/10.3390/nano12193269

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9565762/
https://www.ncbi.nlm.nih.gov/pubmed/36234396
http://dx.doi.org/10.3390/nano12193269

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