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Versatile Approach of Silicon Nanofabrication without Resists: Helium Ion-Bombardment Enhanced Etching
Herein, we report a helium ion-bombardment enhanced etching method for silicon nanofabrication without the use of resists; furthermore, we demonstrate its unique advantages for straightforward fabrication on irregular surfaces and prototyping nano-electro-mechanical system devices, such as self-encl...
Autores principales: | , , , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
MDPI
2022
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9565762/ https://www.ncbi.nlm.nih.gov/pubmed/36234396 http://dx.doi.org/10.3390/nano12193269 |
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author | Wen, Xiaolei Zhang, Lansheng Tian, Feng Xu, Yang Hu, Huan |
author_facet | Wen, Xiaolei Zhang, Lansheng Tian, Feng Xu, Yang Hu, Huan |
author_sort | Wen, Xiaolei |
collection | PubMed |
description | Herein, we report a helium ion-bombardment enhanced etching method for silicon nanofabrication without the use of resists; furthermore, we demonstrate its unique advantages for straightforward fabrication on irregular surfaces and prototyping nano-electro-mechanical system devices, such as self-enclosed Si nanofluidic channels and mechanical nano-resonators. This method employs focused helium ions to selectively irradiate single-crystal Si to disrupt the crystal lattice and transform it into an amorphous phase that can be etched at a rate 200 times higher than that of the non-irradiated Si. Due to the unique raindrop shape of the interaction volumes between helium ions and Si, buried Si nanofluidic channels can be constructed using only one dosing step, followed by one step of conventional chemical etching. Moreover, suspended Si nanobeams can be fabricated without an additional undercut step for release owing to the unique raindrop shape. In addition, we demonstrate nanofabrication directly on 3D micro/nano surfaces, such as an atomic force microscopic probe, which is challenging for conventional nanofabrication due to the requirement of photoresist spin coating. Finally, this approach can also be extended to assist in the etching of other materials that are difficult to etch, such as silicon carbide (SiC). |
format | Online Article Text |
id | pubmed-9565762 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2022 |
publisher | MDPI |
record_format | MEDLINE/PubMed |
spelling | pubmed-95657622022-10-15 Versatile Approach of Silicon Nanofabrication without Resists: Helium Ion-Bombardment Enhanced Etching Wen, Xiaolei Zhang, Lansheng Tian, Feng Xu, Yang Hu, Huan Nanomaterials (Basel) Article Herein, we report a helium ion-bombardment enhanced etching method for silicon nanofabrication without the use of resists; furthermore, we demonstrate its unique advantages for straightforward fabrication on irregular surfaces and prototyping nano-electro-mechanical system devices, such as self-enclosed Si nanofluidic channels and mechanical nano-resonators. This method employs focused helium ions to selectively irradiate single-crystal Si to disrupt the crystal lattice and transform it into an amorphous phase that can be etched at a rate 200 times higher than that of the non-irradiated Si. Due to the unique raindrop shape of the interaction volumes between helium ions and Si, buried Si nanofluidic channels can be constructed using only one dosing step, followed by one step of conventional chemical etching. Moreover, suspended Si nanobeams can be fabricated without an additional undercut step for release owing to the unique raindrop shape. In addition, we demonstrate nanofabrication directly on 3D micro/nano surfaces, such as an atomic force microscopic probe, which is challenging for conventional nanofabrication due to the requirement of photoresist spin coating. Finally, this approach can also be extended to assist in the etching of other materials that are difficult to etch, such as silicon carbide (SiC). MDPI 2022-09-20 /pmc/articles/PMC9565762/ /pubmed/36234396 http://dx.doi.org/10.3390/nano12193269 Text en © 2022 by the authors. https://creativecommons.org/licenses/by/4.0/Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/4.0/). |
spellingShingle | Article Wen, Xiaolei Zhang, Lansheng Tian, Feng Xu, Yang Hu, Huan Versatile Approach of Silicon Nanofabrication without Resists: Helium Ion-Bombardment Enhanced Etching |
title | Versatile Approach of Silicon Nanofabrication without Resists: Helium Ion-Bombardment Enhanced Etching |
title_full | Versatile Approach of Silicon Nanofabrication without Resists: Helium Ion-Bombardment Enhanced Etching |
title_fullStr | Versatile Approach of Silicon Nanofabrication without Resists: Helium Ion-Bombardment Enhanced Etching |
title_full_unstemmed | Versatile Approach of Silicon Nanofabrication without Resists: Helium Ion-Bombardment Enhanced Etching |
title_short | Versatile Approach of Silicon Nanofabrication without Resists: Helium Ion-Bombardment Enhanced Etching |
title_sort | versatile approach of silicon nanofabrication without resists: helium ion-bombardment enhanced etching |
topic | Article |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9565762/ https://www.ncbi.nlm.nih.gov/pubmed/36234396 http://dx.doi.org/10.3390/nano12193269 |
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