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Versatile Approach of Silicon Nanofabrication without Resists: Helium Ion-Bombardment Enhanced Etching
Herein, we report a helium ion-bombardment enhanced etching method for silicon nanofabrication without the use of resists; furthermore, we demonstrate its unique advantages for straightforward fabrication on irregular surfaces and prototyping nano-electro-mechanical system devices, such as self-encl...
| Autores principales: | , , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
MDPI
2022
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9565762/ https://www.ncbi.nlm.nih.gov/pubmed/36234396 http://dx.doi.org/10.3390/nano12193269 |