Plasma-Assisted Nanofabrication: The Potential and Challenges in Atomic Layer Deposition and Etching

The growing need for increasingly miniaturized devices has placed high importance and demands on nanofabrication technologies with high-quality, low temperatures, and low-cost techniques. In the past few years, the development and recent advances in atomic layer deposition (ALD) processes boosted in...

Descripción completa

Detalles Bibliográficos
Autores principales: Chiappim, William, Neto, Benedito Botan, Shiotani, Michaela, Karnopp, Júlia, Gonçalves, Luan, Chaves, João Pedro, Sobrinho, Argemiro da Silva, Leitão, Joaquim Pratas, Fraga, Mariana, Pessoa, Rodrigo
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2022
Materias:
Review
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9565849/
https://www.ncbi.nlm.nih.gov/pubmed/36234624
http://dx.doi.org/10.3390/nano12193497

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9565849/
https://www.ncbi.nlm.nih.gov/pubmed/36234624
http://dx.doi.org/10.3390/nano12193497

Ejemplares similares