Optimized study of the annealing effect on the electrical and structural properties of HDLC thin-films

The plasma-enhanced chemical vapor deposition (PECVD) technique has been utilized for the facile surface deposition of hydrogenated diamond-like carbon (HDLC) thin-films onto Si(100) substrates. The as-deposited film surface is homogenous, free of pinholes, and adheres to the substrate. Annealing of...

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Detalles Bibliográficos
Autores principales: Biswas, Hari Shankar, Datta, Jagannath, Mandal, Prasenjit, Poddar, Sandeep, Kundu, Amit Kumar, Saha, Indranil
Formato: Online Artículo Texto
Lenguaje:English
Publicado: The Royal Society of Chemistry 2022
Materias:
Chemistry
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9578290/
https://www.ncbi.nlm.nih.gov/pubmed/36321089
http://dx.doi.org/10.1039/d2ra06255k

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9578290/
https://www.ncbi.nlm.nih.gov/pubmed/36321089
http://dx.doi.org/10.1039/d2ra06255k

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