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Optimized study of the annealing effect on the electrical and structural properties of HDLC thin-films
The plasma-enhanced chemical vapor deposition (PECVD) technique has been utilized for the facile surface deposition of hydrogenated diamond-like carbon (HDLC) thin-films onto Si(100) substrates. The as-deposited film surface is homogenous, free of pinholes, and adheres to the substrate. Annealing of...
Autores principales: | , , , , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
The Royal Society of Chemistry
2022
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9578290/ https://www.ncbi.nlm.nih.gov/pubmed/36321089 http://dx.doi.org/10.1039/d2ra06255k |
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author | Biswas, Hari Shankar Datta, Jagannath Mandal, Prasenjit Poddar, Sandeep Kundu, Amit Kumar Saha, Indranil |
author_facet | Biswas, Hari Shankar Datta, Jagannath Mandal, Prasenjit Poddar, Sandeep Kundu, Amit Kumar Saha, Indranil |
author_sort | Biswas, Hari Shankar |
collection | PubMed |
description | The plasma-enhanced chemical vapor deposition (PECVD) technique has been utilized for the facile surface deposition of hydrogenated diamond-like carbon (HDLC) thin-films onto Si(100) substrates. The as-deposited film surface is homogenous, free of pinholes, and adheres to the substrate. Annealing of the synthesized HDLC surface in a vacuum was performed in the temperature range of 200 to 1000 °C. A host of instrumental techniques, viz. FTIR spectroscopy, AFM, STM, and EC-AFM, were successfully employed to detect the morphological transformation in the HDLC films upon annealing. EC-AFM studies show irreversible biased behavior after undergoing a surface redox couple reaction and morphological change. Raman spectroscopy was carried out along with STM and EC-AFM to determine the functional nature and conductivity of the annealed surface. |
format | Online Article Text |
id | pubmed-9578290 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2022 |
publisher | The Royal Society of Chemistry |
record_format | MEDLINE/PubMed |
spelling | pubmed-95782902022-10-31 Optimized study of the annealing effect on the electrical and structural properties of HDLC thin-films Biswas, Hari Shankar Datta, Jagannath Mandal, Prasenjit Poddar, Sandeep Kundu, Amit Kumar Saha, Indranil RSC Adv Chemistry The plasma-enhanced chemical vapor deposition (PECVD) technique has been utilized for the facile surface deposition of hydrogenated diamond-like carbon (HDLC) thin-films onto Si(100) substrates. The as-deposited film surface is homogenous, free of pinholes, and adheres to the substrate. Annealing of the synthesized HDLC surface in a vacuum was performed in the temperature range of 200 to 1000 °C. A host of instrumental techniques, viz. FTIR spectroscopy, AFM, STM, and EC-AFM, were successfully employed to detect the morphological transformation in the HDLC films upon annealing. EC-AFM studies show irreversible biased behavior after undergoing a surface redox couple reaction and morphological change. Raman spectroscopy was carried out along with STM and EC-AFM to determine the functional nature and conductivity of the annealed surface. The Royal Society of Chemistry 2022-10-18 /pmc/articles/PMC9578290/ /pubmed/36321089 http://dx.doi.org/10.1039/d2ra06255k Text en This journal is © The Royal Society of Chemistry https://creativecommons.org/licenses/by-nc/3.0/ |
spellingShingle | Chemistry Biswas, Hari Shankar Datta, Jagannath Mandal, Prasenjit Poddar, Sandeep Kundu, Amit Kumar Saha, Indranil Optimized study of the annealing effect on the electrical and structural properties of HDLC thin-films |
title | Optimized study of the annealing effect on the electrical and structural properties of HDLC thin-films |
title_full | Optimized study of the annealing effect on the electrical and structural properties of HDLC thin-films |
title_fullStr | Optimized study of the annealing effect on the electrical and structural properties of HDLC thin-films |
title_full_unstemmed | Optimized study of the annealing effect on the electrical and structural properties of HDLC thin-films |
title_short | Optimized study of the annealing effect on the electrical and structural properties of HDLC thin-films |
title_sort | optimized study of the annealing effect on the electrical and structural properties of hdlc thin-films |
topic | Chemistry |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9578290/ https://www.ncbi.nlm.nih.gov/pubmed/36321089 http://dx.doi.org/10.1039/d2ra06255k |
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