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Optimized study of the annealing effect on the electrical and structural properties of HDLC thin-films
The plasma-enhanced chemical vapor deposition (PECVD) technique has been utilized for the facile surface deposition of hydrogenated diamond-like carbon (HDLC) thin-films onto Si(100) substrates. The as-deposited film surface is homogenous, free of pinholes, and adheres to the substrate. Annealing of...
Autores principales: | Biswas, Hari Shankar, Datta, Jagannath, Mandal, Prasenjit, Poddar, Sandeep, Kundu, Amit Kumar, Saha, Indranil |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
The Royal Society of Chemistry
2022
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9578290/ https://www.ncbi.nlm.nih.gov/pubmed/36321089 http://dx.doi.org/10.1039/d2ra06255k |
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