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Fabrication of Multilayer Molds by Dry Film Photoresist

Dry film photoresists are widely employed to fabricate high-aspect-ratio microstructures, such as molds for microfluidic devices. Unlike liquid resists, such as SU-8, dry films do not require a cleanroom facility, and it is straightforward to prepare uniform and reproducible films as thick as 500 µm...

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Detalles Bibliográficos
Autores principales: Koucherian, Narek E., Yan, Shijun, Hui, Elliot E.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2022
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9608710/
https://www.ncbi.nlm.nih.gov/pubmed/36295936
http://dx.doi.org/10.3390/mi13101583