Self-Aligned Crystallographic Multiplication of Nanoscale Silicon Wedges for High-Density Fabrication of 3D Nanodevices

[Image: see text] High-density arrays of silicon wedges bound by {111} planes on silicon (100) wafers have been created by combining convex corner lithography on a silicon dioxide hard mask with anisotropic, crystallographic etching in a repetitive, self-aligned multiplication procedure. A mean pitc...

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Detalles Bibliográficos
Autores principales: Berenschot, Erwin, Tiggelaar, Roald M., Borgelink, Bjorn, van Kampen, Chris, Deenen, Cristian S., Pordeli, Yasser, Witteveen, Haye, Gardeniers, Han J. G. E., Tas, Niels R.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: American Chemical Society 2022
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9623545/
https://www.ncbi.nlm.nih.gov/pubmed/36338331
http://dx.doi.org/10.1021/acsanm.2c04079

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9623545/
https://www.ncbi.nlm.nih.gov/pubmed/36338331
http://dx.doi.org/10.1021/acsanm.2c04079

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