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Engineering thermal transport within Si thin films: The impact of nanoslot alignment and ion implantation
In recent years, nanoporous Si films have been intensively studied for their potential applications in thermoelectrics and the thermal management of devices. To minimize the thermal conductivity, ultrafine nanoporous patterns are required but the smallest structure size is largely limited by the spa...
| Autores principales: | , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
Elsevier
2022
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9636053/ https://www.ncbi.nlm.nih.gov/pubmed/36345333 http://dx.doi.org/10.1016/j.isci.2022.105386 |