Study on the Deposition Uniformity of Triple-Target Magnetron Co-Sputtering System: Numerical Simulation and Experiment

The uniformity of magnetron-sputtered films can be evaluated using an analytical model whose key parameters, such as included angle cosine and distance between infinitesimal elements, are so far calculated based on targets-substrate geometric relation. This existing computation scheme is not applica...

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Detalles Bibliográficos
Autores principales: Zhu, Guo, Xiao, Baijun, Chen, Ganxin, Gan, Zhiyin
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2022
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9654636/
https://www.ncbi.nlm.nih.gov/pubmed/36363362
http://dx.doi.org/10.3390/ma15217770

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9654636/
https://www.ncbi.nlm.nih.gov/pubmed/36363362
http://dx.doi.org/10.3390/ma15217770

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