Stability of Wafer-Scale Thin Films of Vertically Aligned Hexagonal BN Nanosheets Exposed to High-Energy Ions and Reactive Atomic Oxygen

Stability of advanced functional materials subjected to extreme conditions involving ion bombardment, radiation, or reactive chemicals is crucial for diverse applications. Here we demonstrate the excellent stability of wafer-scale thin films of vertically aligned hexagonal BN nanosheets (hBNNS) expo...

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Detalles Bibliográficos
Autores principales: Huang, Shiyong, Ng, Zhi Kai, Li, Hongling, Chaturvedi, Apoorva, Lim, Jian Wei Mark, Tay, Roland Yingjie, Teo, Edwin Hang Tong, Xu, Shuyan, Ostrikov, Kostya (Ken), Tsang, Siu Hon
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2022
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9655786/
https://www.ncbi.nlm.nih.gov/pubmed/36364652
http://dx.doi.org/10.3390/nano12213876

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9655786/
https://www.ncbi.nlm.nih.gov/pubmed/36364652
http://dx.doi.org/10.3390/nano12213876

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