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Stability of Wafer-Scale Thin Films of Vertically Aligned Hexagonal BN Nanosheets Exposed to High-Energy Ions and Reactive Atomic Oxygen
Stability of advanced functional materials subjected to extreme conditions involving ion bombardment, radiation, or reactive chemicals is crucial for diverse applications. Here we demonstrate the excellent stability of wafer-scale thin films of vertically aligned hexagonal BN nanosheets (hBNNS) expo...
Autores principales: | Huang, Shiyong, Ng, Zhi Kai, Li, Hongling, Chaturvedi, Apoorva, Lim, Jian Wei Mark, Tay, Roland Yingjie, Teo, Edwin Hang Tong, Xu, Shuyan, Ostrikov, Kostya (Ken), Tsang, Siu Hon |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
MDPI
2022
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9655786/ https://www.ncbi.nlm.nih.gov/pubmed/36364652 http://dx.doi.org/10.3390/nano12213876 |
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