Kinetics of Catalyst-Free and Position-Controlled Low-Pressure Chemical Vapor Deposition Growth of VO(2) Nanowire Arrays on Nanoimprinted Si Substrates

In the present article, the position-controlled and catalytic-free synthesis of vanadium dioxide (VO(2)) nanowires (NWs) grown by the chemical vapor deposition (CVD) on nanoimprinted silicon substrates in the form of nanopillar arrays was analyzed. The NW growth on silicon nanopillars with different...

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Detalles Bibliográficos
Autores principales: Mutilin, Sergey V., Yakovkina, Lyubov V., Seleznev, Vladimir A., Prinz, Victor Ya.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2022
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9656171/
https://www.ncbi.nlm.nih.gov/pubmed/36363453
http://dx.doi.org/10.3390/ma15217863

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9656171/
https://www.ncbi.nlm.nih.gov/pubmed/36363453
http://dx.doi.org/10.3390/ma15217863

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