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Database Development of SiO(2) Etching with Fluorocarbon Plasmas Diluted with Various Noble Gases of Ar, Kr, and Xe
In the semiconductor industry, fluorocarbon (FC) plasma is widely used in SiO(2) etching, with Ar typically employed in the dilution of the FC plasma due to its cost effectiveness and accessibility. While it has been reported that plasmas with other noble gases, namely Kr and Xe, have distinct physi...
| Autores principales: | , , , , , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
MDPI
2022
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9658225/ https://www.ncbi.nlm.nih.gov/pubmed/36364604 http://dx.doi.org/10.3390/nano12213828 |