Engineering high quality graphene superlattices via ion milled ultra-thin etching masks

Nanofabrication research pursues the miniaturization of patterned feature size. In the current state of the art, micron scale areas can be patterned with features down to ~30 nm pitch using electron beam lithography. Here, we demonstrate a nanofabrication technique which allows patterning periodic s...

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Detalles Bibliográficos
Autores principales: Barcons Ruiz, David, Herzig Sheinfux, Hanan, Hoffmann, Rebecca, Torre, Iacopo, Agarwal, Hitesh, Kumar, Roshan Krishna, Vistoli, Lorenzo, Taniguchi, Takashi, Watanabe, Kenji, Bachtold, Adrian, Koppens, Frank H. L.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group UK 2022
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9663573/
https://www.ncbi.nlm.nih.gov/pubmed/36376311
http://dx.doi.org/10.1038/s41467-022-34734-3

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9663573/
https://www.ncbi.nlm.nih.gov/pubmed/36376311
http://dx.doi.org/10.1038/s41467-022-34734-3

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