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Identification and classification of particle contaminants on photomasks based on individual-particle Raman scattering spectra and SEM images
Particle contamination of photo masks is a significant issue facing the micro-nanofabrication process. It is necessary to analyze the particulate matter so that the contamination can be effectively controlled and eliminated. In this study, Raman spectroscopy was used in combination with scanning ele...
| Autores principales: | , , , , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
The Royal Society of Chemistry
2022
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9679918/ https://www.ncbi.nlm.nih.gov/pubmed/36425188 http://dx.doi.org/10.1039/d2ra05672k |