Optimization of Sputtering Process for Medium Entropy Alloy Nanotwinned CoCrFeNi Thin Films by Taguchi Method

We demonstrate a systematic study optimizing the properties of CoCrFeNi medium entropy alloy (MEA) thin films by tuning the deposition parameters of the pulsed direct current (DC) magnetron sputtering process. The chemical composition and microstructure of thin films were studied with energy dispers...

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Detalles Bibliográficos
Autores principales: Zhong, Jing-Yi, Wang, Jian-Jie, Ouyang, Fan-Yi
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2022
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9693865/
https://www.ncbi.nlm.nih.gov/pubmed/36431722
http://dx.doi.org/10.3390/ma15228238

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9693865/
https://www.ncbi.nlm.nih.gov/pubmed/36431722
http://dx.doi.org/10.3390/ma15228238

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