Mechanical Properties and Oxidation Behavior of TaWSiN Films

This study explored the structural characteristics, mechanical properties, and oxidation behavior of W-enriched TaWSiN films prepared through co-sputtering. The atomic ratios [W/(W + Ta)] of the as-deposited films maintained a range of 0.77–0.81. The TaWSiN films with a Si content of 0–13 at.% were...

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Detalles Bibliográficos
Autores principales: Tzeng, Chin-Han, Chang, Li-Chun, Chen, Yung-I
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2022
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9696402/
https://www.ncbi.nlm.nih.gov/pubmed/36431666
http://dx.doi.org/10.3390/ma15228179

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9696402/
https://www.ncbi.nlm.nih.gov/pubmed/36431666
http://dx.doi.org/10.3390/ma15228179

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