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A Study on the Resolution and Depth of Focus of ArF Immersion Photolithography
In this study, the resolution and depth of focus (DOF) of the ArF immersion scanner are measured experimentally according to numerical aperture (NA). Based on the experiment, the theoretical trade-off relationship between the resolution and depth of focus can be confirmed and k(1) and k(2) are extra...
| Autores principales: | , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
MDPI
2022
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9696816/ https://www.ncbi.nlm.nih.gov/pubmed/36422400 http://dx.doi.org/10.3390/mi13111971 |