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Charge Trap States of SiC Power TrenchMOS Transistor under Repetitive Unclamped Inductive Switching Stress

Silicon carbide (SiC) has been envisioned as an almost ideal material for power electronic devices; however, device reliability is still a great challenge. Here we investigate the reliability of commercial 1.2-kV 4H-SiC MOSFETs under repetitive unclamped inductive switching (UIS). The stress invoked...

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Autores principales: Marek, Juraj, Kozarik, Jozef, Minarik, Michal, Chvála, Aleš, Matus, Matej, Donoval, Martin, Stuchlikova, Lubica, Weis, Martin
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2022
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9697379/
https://www.ncbi.nlm.nih.gov/pubmed/36431714
http://dx.doi.org/10.3390/ma15228230
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author Marek, Juraj
Kozarik, Jozef
Minarik, Michal
Chvála, Aleš
Matus, Matej
Donoval, Martin
Stuchlikova, Lubica
Weis, Martin
author_facet Marek, Juraj
Kozarik, Jozef
Minarik, Michal
Chvála, Aleš
Matus, Matej
Donoval, Martin
Stuchlikova, Lubica
Weis, Martin
author_sort Marek, Juraj
collection PubMed
description Silicon carbide (SiC) has been envisioned as an almost ideal material for power electronic devices; however, device reliability is still a great challenge. Here we investigate the reliability of commercial 1.2-kV 4H-SiC MOSFETs under repetitive unclamped inductive switching (UIS). The stress invoked degradation of the device characteristics, including the output and transfer characteristics, drain leakage current, and capacitance characteristics. Besides the shift of steady-state electrical characteristics, a significant change in switching times points out the charge trapping phenomenon. Transient capacitance spectroscopy was applied to investigate charge traps in the virgin device as well as after UIS stress. The intrinsic traps due to metal impurities or [Formula: see text] transitions were recognized in the virgin device. The UIS stress caused suppression of the second stage of the [Formula: see text] transition, and only the first stage, [Formula: see text] , was observed. Hence, the UIS stress is causing the reduction of multiple charging of carbon vacancies in SiC-based devices.
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spelling pubmed-96973792022-11-26 Charge Trap States of SiC Power TrenchMOS Transistor under Repetitive Unclamped Inductive Switching Stress Marek, Juraj Kozarik, Jozef Minarik, Michal Chvála, Aleš Matus, Matej Donoval, Martin Stuchlikova, Lubica Weis, Martin Materials (Basel) Article Silicon carbide (SiC) has been envisioned as an almost ideal material for power electronic devices; however, device reliability is still a great challenge. Here we investigate the reliability of commercial 1.2-kV 4H-SiC MOSFETs under repetitive unclamped inductive switching (UIS). The stress invoked degradation of the device characteristics, including the output and transfer characteristics, drain leakage current, and capacitance characteristics. Besides the shift of steady-state electrical characteristics, a significant change in switching times points out the charge trapping phenomenon. Transient capacitance spectroscopy was applied to investigate charge traps in the virgin device as well as after UIS stress. The intrinsic traps due to metal impurities or [Formula: see text] transitions were recognized in the virgin device. The UIS stress caused suppression of the second stage of the [Formula: see text] transition, and only the first stage, [Formula: see text] , was observed. Hence, the UIS stress is causing the reduction of multiple charging of carbon vacancies in SiC-based devices. MDPI 2022-11-19 /pmc/articles/PMC9697379/ /pubmed/36431714 http://dx.doi.org/10.3390/ma15228230 Text en © 2022 by the authors. https://creativecommons.org/licenses/by/4.0/Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/4.0/).
spellingShingle Article
Marek, Juraj
Kozarik, Jozef
Minarik, Michal
Chvála, Aleš
Matus, Matej
Donoval, Martin
Stuchlikova, Lubica
Weis, Martin
Charge Trap States of SiC Power TrenchMOS Transistor under Repetitive Unclamped Inductive Switching Stress
title Charge Trap States of SiC Power TrenchMOS Transistor under Repetitive Unclamped Inductive Switching Stress
title_full Charge Trap States of SiC Power TrenchMOS Transistor under Repetitive Unclamped Inductive Switching Stress
title_fullStr Charge Trap States of SiC Power TrenchMOS Transistor under Repetitive Unclamped Inductive Switching Stress
title_full_unstemmed Charge Trap States of SiC Power TrenchMOS Transistor under Repetitive Unclamped Inductive Switching Stress
title_short Charge Trap States of SiC Power TrenchMOS Transistor under Repetitive Unclamped Inductive Switching Stress
title_sort charge trap states of sic power trenchmos transistor under repetitive unclamped inductive switching stress
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9697379/
https://www.ncbi.nlm.nih.gov/pubmed/36431714
http://dx.doi.org/10.3390/ma15228230
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