Efficient Rigorous Coupled-Wave Analysis Simulation of Mueller Matrix Ellipsometry of Three-Dimensional Multilayer Nanostructures

Mueller matrix ellipsometry (MME) is a powerful metrology tool for nanomanufacturing. The application of MME necessitates electromagnetic computations for inverse problems of metrology determination in both the conventional optimization process and the recent neutral network approach. In this study,...

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Detalles Bibliográficos
Autores principales: Pham, Hoang-Lam, Alcaire, Thomas, Soulan, Sebastien, Le Cunff, Delphine, Tortai, Jean-Hervé
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2022
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9698230/
https://www.ncbi.nlm.nih.gov/pubmed/36432236
http://dx.doi.org/10.3390/nano12223951

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9698230/
https://www.ncbi.nlm.nih.gov/pubmed/36432236
http://dx.doi.org/10.3390/nano12223951

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