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Near-field infrared nanoscopic study of EUV- and e-beam-exposed hydrogen silsesquioxane photoresist

This article presents a technique of scattering-type scanning near-field optical microscopy (s-SNOM) based on scanning probe microscopy as a nanoscale-resolution chemical visualization technique of the structural changes in photoresist thin films. Chemical investigations were conducted in the nanome...

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Detalles Bibliográficos
Autores principales: Kim, Jiho, Lee, Jin-Kyun, Chae, Boknam, Ahn, Jinho, Lee, Sangsul
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Springer Nature Singapore 2022
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9718909/
https://www.ncbi.nlm.nih.gov/pubmed/36459274
http://dx.doi.org/10.1186/s40580-022-00345-3