Cargando…
Near-field infrared nanoscopic study of EUV- and e-beam-exposed hydrogen silsesquioxane photoresist
This article presents a technique of scattering-type scanning near-field optical microscopy (s-SNOM) based on scanning probe microscopy as a nanoscale-resolution chemical visualization technique of the structural changes in photoresist thin films. Chemical investigations were conducted in the nanome...
Autores principales: | Kim, Jiho, Lee, Jin-Kyun, Chae, Boknam, Ahn, Jinho, Lee, Sangsul |
---|---|
Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
Springer Nature Singapore
2022
|
Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9718909/ https://www.ncbi.nlm.nih.gov/pubmed/36459274 http://dx.doi.org/10.1186/s40580-022-00345-3 |
Ejemplares similares
-
Beyond EUV lithography: a comparative study of efficient photoresists' performance
por: Mojarad, Nassir, et al.
Publicado: (2015) -
Investigating the Degradation of EUV Transmittance of an EUV Pellicle Membrane
por: Wi, Seong Ju, et al.
Publicado: (2022) -
Molecular Modeling of EUV Photoresist Revealing the Effect of Chain Conformation on Line-Edge Roughness Formation
por: Park, Juhae, et al.
Publicado: (2019) -
Investigation of correlative parameters to evaluate EUV lithographic performance of PMMA
por: Kim, Kanghyun, et al.
Publicado: (2022) -
Patterning highly ordered arrays of complex nanofeatures through EUV directed polarity switching of non chemically amplified photoresist
por: Ghosh, Subrata, et al.
Publicado: (2016)