Gradient area-selective deposition for seamless gap-filling in 3D nanostructures through surface chemical reactivity control

The integration of bottom-up fabrication techniques and top-down methods can overcome current limits in nanofabrication. For such integration, we propose a gradient area-selective deposition using atomic layer deposition to overcome the inherent limitation of 3D nanofabrication and demonstrate the a...

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Detalles Bibliográficos
Autores principales: Nguyen, Chi Thang, Cho, Eun-Hyoung, Gu, Bonwook, Lee, Sunghee, Kim, Hae-Sung, Park, Jeongwoo, Yu, Neung-Kyung, Shin, Sangwoo, Shong, Bonggeun, Lee, Jeong Yub, Lee, Han-Bo-Ram
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group UK 2022
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9734176/
https://www.ncbi.nlm.nih.gov/pubmed/36494441
http://dx.doi.org/10.1038/s41467-022-35428-6

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9734176/
https://www.ncbi.nlm.nih.gov/pubmed/36494441
http://dx.doi.org/10.1038/s41467-022-35428-6

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