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Gradient area-selective deposition for seamless gap-filling in 3D nanostructures through surface chemical reactivity control
The integration of bottom-up fabrication techniques and top-down methods can overcome current limits in nanofabrication. For such integration, we propose a gradient area-selective deposition using atomic layer deposition to overcome the inherent limitation of 3D nanofabrication and demonstrate the a...
| Autores principales: | , , , , , , , , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
Nature Publishing Group UK
2022
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9734176/ https://www.ncbi.nlm.nih.gov/pubmed/36494441 http://dx.doi.org/10.1038/s41467-022-35428-6 |