Cargando…

Atomic-Level Sn Doping Effect in Ga(2)O(3) Films Using Plasma-Enhanced Atomic Layer Deposition

In this work, the atomic level doping of Sn into Ga(2)O(3) films was successfully deposited by using a plasma-enhanced atomic layer deposition method. Here, we systematically studied the changes in the chemical state, microstructure evolution, optical properties, energy band alignment, and electrica...

Descripción completa

Detalles Bibliográficos
Autores principales:	Shen, Yi, Ma, Hong-Ping, Gu, Lin, Zhang, Jie, Huang, Wei, Zhu, Jing-Tao, Zhang, Qing-Chun
Formato:	Online Artículo Texto
Lenguaje:	English
Publicado:	MDPI 2022
Materias:	Article
Acceso en línea:	https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9737259/ https://www.ncbi.nlm.nih.gov/pubmed/36500879 http://dx.doi.org/10.3390/nano12234256

Ejemplares similares

Deposition Mechanism and Characterization of Plasma-Enhanced Atomic Layer-Deposited SnO(x) Films at Different Substrate Temperatures
por: Huang, Pao-Hsun, et al.
Publicado: (2022)

Compact Ga(2)O(3) Thin Films Deposited by Plasma Enhanced Atomic Layer Deposition at Low Temperature
por: Yang, Yue, et al.
Publicado: (2022)

Structural, electrical, and optical properties of Ti-doped ZnO films fabricated by atomic layer deposition
por: Ye, Zhi-Yuan, et al.
Publicado: (2013)

Effects of Al Doping on the Properties of ZnO Thin Films Deposited by Atomic Layer Deposition
por: Zhai, Chen-Hui, et al.
Publicado: (2016)

Effects of doping and annealing on properties of ZnO films grown by atomic layer deposition
por: Wang, Aiji, et al.
Publicado: (2015)

Plasma-Assisted Atomic Layer Deposition of High-Density Ni Nanoparticles for Amorphous In-Ga-Zn-O Thin Film Transistor Memory
por: Qian, Shi-Bing, et al.
Publicado: (2017)

Atomic layer deposition of superparamagnetic ruthenium-doped iron oxide thin film
por: Tamm, Aile, et al.
Publicado: (2021)

Chemical Reaction and Ion Bombardment Effects of Plasma Radicals on Optoelectrical Properties of SnO(2) Thin Films via Atomic Layer Deposition
por: Huang, Pao-Hsun, et al.
Publicado: (2021)

The Effects of Zr Doping on the Optical, Electrical and Microstructural Properties of Thin ZnO Films Deposited by Atomic Layer Deposition
por: Herodotou, Stephania, et al.
Publicado: (2015)

Nature of GaO(x) Shells Grown on Silica by Atomic Layer Deposition
por: Chen, Zixuan, et al.
Publicado: (2023)

Influence of argon plasma on the deposition of Al(2)O(3) film onto the PET surfaces by atomic layer deposition
por: Edy, Riyanto, et al.
Publicado: (2013)

Atomic Layer Deposition of Photoconductive Cu(2)O Thin Films
por: Iivonen, Tomi, et al.
Publicado: (2019)

Schottky Contacts to ZnO-Nanocoated SnSe Powders by Atomic Layer Deposition
por: Kim, Hogyoung, et al.
Publicado: (2022)

Surface Passivation of Silicon Using HfO(2) Thin Films Deposited by Remote Plasma Atomic Layer Deposition System
por: Zhang, Xiao-Ying, et al.
Publicado: (2017)

The Influence of Hafnium Doping on Density of States in Zinc Oxide Thin-Film Transistors Deposited via Atomic Layer Deposition
por: Ding, Xingwei, et al.
Publicado: (2017)

Improved Ferroelectric Performance of Mg-Doped LiNbO(3) Films by an Ideal Atomic Layer Deposited Al(2)O(3) Tunnel Switch Layer
por: Zhang, Yan, et al.
Publicado: (2019)

Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition
por: Kim, Hyo Jin K., et al.
Publicado: (2019)

Wafer-Scale Synthesis of WS(2) Films with In Situ Controllable p-Type Doping by Atomic Layer Deposition
por: Yang, Hanjie, et al.
Publicado: (2021)

Low-Temperature Plasma-Assisted Atomic-Layer-Deposited SnO(2) as an Electron Transport Layer in Planar Perovskite Solar Cells
por: Kuang, Yinghuan, et al.
Publicado: (2018)

Investigation of Ga(2)O(3)-Based Deep Ultraviolet Photodetectors Using Plasma-Enhanced Atomic Layer Deposition System
por: Chu, Shao-Yu, et al.
Publicado: (2020)

Plasma-Assisted Atomic Layer Deposition of IrO(2) for Neuroelectronics
por: Di Palma, Valerio, et al.
Publicado: (2023)

Investigation on Transparent, Conductive ZnO:Al Films Deposited by Atomic Layer Deposition Process
por: Zhao, Kai, et al.
Publicado: (2022)

Erratum to: The Influence of Hafnium Doping on Density-of-States in Zinc Oxide Thin-Film Fransistors Deposited Via Atomic Layer Deposition
por: Ding, Xingwei, et al.
Publicado: (2017)

Growth of GaN Thin Films Using Plasma Enhanced Atomic Layer Deposition: Effect of Ammonia-Containing Plasma Power on Residual Oxygen Capture
por: Jiang, Shicong, et al.
Publicado: (2022)

Deposition Mechanism and Properties of Plasma-Enhanced Atomic Layer Deposited Gallium Nitride Films with Different Substrate Temperatures
por: Ren, Fang-Bin, et al.
Publicado: (2022)

Hardness, Modulus, and Refractive Index of Plasma-Assisted Atomic-Layer-Deposited Hafnium Oxide Thin Films Doped with Aluminum Oxide
por: Kull, Mikk, et al.
Publicado: (2023)

Electrical and optical properties of Al-doped ZnO and ZnAl(2)O(4) films prepared by atomic layer deposition
por: Hou, Qiongqiong, et al.
Publicado: (2013)

Impact of Ions on Film Conformality and Crystallinity during Plasma-Assisted Atomic Layer Deposition of TiO(2)
por: Arts, Karsten, et al.
Publicado: (2021)

Atomic-Layer-Deposition of Indium Oxide Nano-films for Thin-Film Transistors
por: Ma, Qian, et al.
Publicado: (2018)

Characteristics of atomic layer deposited Gd(2)O(3) on n-GaN with an AlN layer
por: Kim, Hogyoung, et al.
Publicado: (2018)

Enhancement in Photoelectrochemical Performance of Optimized Amorphous SnS(2) Thin Film Fabricated through Atomic Layer Deposition
por: Hu, Weiguang, et al.
Publicado: (2019)

Bi-layer Channel AZO/ZnO Thin Film Transistors Fabricated by Atomic Layer Deposition Technique
por: Li, Huijin, et al.
Publicado: (2017)

Atomic layer deposited films of Al(2)O(3) on fluorine-doped tin oxide electrodes: stability and barrier properties
por: Krýsová, Hana, et al.
Publicado: (2021)

Atomic Layer Deposition of Ultrathin ZnO Films for Hybrid Window Layers for Cu(In(x),Ga(1−x))Se(2) Solar Cells
por: Lee, Jaebaek, et al.
Publicado: (2021)

Atomistic Simulations of Plasma-Enhanced Atomic Layer Deposition
por: Becker, Martin, et al.
Publicado: (2019)

Chemically Stable Atomic-Layer-Deposited Al(2)O(3) Films for Processability
por: Broas, Mikael, et al.
Publicado: (2017)

Fermi Level Tuning of ZnO Films Through Supercycled Atomic Layer Deposition
por: Huang, Ruomeng, et al.
Publicado: (2017)

Investigations on the bias temperature stabilities of oxide thin film transistors using In–Ga–Zn–O channels prepared by atomic layer deposition
por: Yoon, So-Jung, et al.
Publicado: (2018)

Voltage-Polarity Dependent Programming Behaviors of Amorphous In–Ga–Zn–O Thin-Film Transistor Memory with an Atomic-Layer-Deposited ZnO Charge Trapping Layer
por: Liu, Dan-Dan, et al.
Publicado: (2019)

Dopant Distribution in Atomic Layer Deposited ZnO:Al Films Visualized by Transmission Electron Microscopy and Atom Probe Tomography
por: Wu, Yizhi, et al.
Publicado: (2018)

Cannot write session to /tmp/vufind_sessions/sess_9t8isqo19k5befc9q5tkiqf03s