Resist nanokirigami for multipurpose patterning

Resist-based patterning solutions play essential roles in modern micro- and nanoscale science and technology. The commonly used ‘resist’ patterning strategy depends on selective-area scission or cross-linking of resist molecules under the action of an energy beam. In this work, we propose and demons...

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Detalles Bibliográficos
Autores principales: Liu, Qing, Chen, Yiqin, Feng, Zhanyong, Shu, Zhiwen, Duan, Huigao
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Oxford University Press 2021
Materias:
Research Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9746683/
https://www.ncbi.nlm.nih.gov/pubmed/36523567
http://dx.doi.org/10.1093/nsr/nwab231

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9746683/
https://www.ncbi.nlm.nih.gov/pubmed/36523567
http://dx.doi.org/10.1093/nsr/nwab231

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