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Investigation of the Effects of Pulse-Atomic Force Nanolithography Parameters on 2.5D Nanostructures’ Morphology

In recent years, Atomic Force Microscope (AFM)-based nanolithography techniques have emerged as a very powerful approach for the machining of countless types of nanostructures. However, the conventional AFM-based nanolithography methods suffer from low efficiency, low rate of patterning, and high co...

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Autores principales: Pellegrino, Paolo, Farella, Isabella, Cascione, Mariafrancesca, De Matteis, Valeria, Bramanti, Alessandro Paolo, Della Torre, Antonio, Quaranta, Fabio, Rinaldi, Rosaria
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2022
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9781517/
https://www.ncbi.nlm.nih.gov/pubmed/36558273
http://dx.doi.org/10.3390/nano12244421
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author Pellegrino, Paolo
Farella, Isabella
Cascione, Mariafrancesca
De Matteis, Valeria
Bramanti, Alessandro Paolo
Della Torre, Antonio
Quaranta, Fabio
Rinaldi, Rosaria
author_facet Pellegrino, Paolo
Farella, Isabella
Cascione, Mariafrancesca
De Matteis, Valeria
Bramanti, Alessandro Paolo
Della Torre, Antonio
Quaranta, Fabio
Rinaldi, Rosaria
author_sort Pellegrino, Paolo
collection PubMed
description In recent years, Atomic Force Microscope (AFM)-based nanolithography techniques have emerged as a very powerful approach for the machining of countless types of nanostructures. However, the conventional AFM-based nanolithography methods suffer from low efficiency, low rate of patterning, and high complexity of execution. In this frame, we first developed an easy and effective nanopatterning technique, termed Pulse-Atomic Force Lithography (P-AFL), with which we were able to pattern 2.5D nanogrooves on a thin polymer layer. Indeed, for the first time, we patterned nanogrooves with either constant or varying depth profiles, with sub-nanometre resolution, high accuracy, and reproducibility. In this paper, we present the results on the investigation of the effects of P-AFL parameters on 2.5D nanostructures’ morphology. We considered three main P-AFL parameters, i.e., the pulse’s amplitude (setpoint), the pulses’ width, and the distance between the following indentations (step), and we patterned arrays of grooves after a precise and well-established variation of the aforementioned parameters. Optimizing the nanolithography process, in terms of patterning time and nanostructures quality, we realized unconventional shape nanostructures with high accuracy and fidelity. Finally, a scanning electron microscope was used to confirm that P-AFL does not induce any damage on AFM tips used to pattern the nanostructures.
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spelling pubmed-97815172022-12-24 Investigation of the Effects of Pulse-Atomic Force Nanolithography Parameters on 2.5D Nanostructures’ Morphology Pellegrino, Paolo Farella, Isabella Cascione, Mariafrancesca De Matteis, Valeria Bramanti, Alessandro Paolo Della Torre, Antonio Quaranta, Fabio Rinaldi, Rosaria Nanomaterials (Basel) Article In recent years, Atomic Force Microscope (AFM)-based nanolithography techniques have emerged as a very powerful approach for the machining of countless types of nanostructures. However, the conventional AFM-based nanolithography methods suffer from low efficiency, low rate of patterning, and high complexity of execution. In this frame, we first developed an easy and effective nanopatterning technique, termed Pulse-Atomic Force Lithography (P-AFL), with which we were able to pattern 2.5D nanogrooves on a thin polymer layer. Indeed, for the first time, we patterned nanogrooves with either constant or varying depth profiles, with sub-nanometre resolution, high accuracy, and reproducibility. In this paper, we present the results on the investigation of the effects of P-AFL parameters on 2.5D nanostructures’ morphology. We considered three main P-AFL parameters, i.e., the pulse’s amplitude (setpoint), the pulses’ width, and the distance between the following indentations (step), and we patterned arrays of grooves after a precise and well-established variation of the aforementioned parameters. Optimizing the nanolithography process, in terms of patterning time and nanostructures quality, we realized unconventional shape nanostructures with high accuracy and fidelity. Finally, a scanning electron microscope was used to confirm that P-AFL does not induce any damage on AFM tips used to pattern the nanostructures. MDPI 2022-12-11 /pmc/articles/PMC9781517/ /pubmed/36558273 http://dx.doi.org/10.3390/nano12244421 Text en © 2022 by the authors. https://creativecommons.org/licenses/by/4.0/Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/4.0/).
spellingShingle Article
Pellegrino, Paolo
Farella, Isabella
Cascione, Mariafrancesca
De Matteis, Valeria
Bramanti, Alessandro Paolo
Della Torre, Antonio
Quaranta, Fabio
Rinaldi, Rosaria
Investigation of the Effects of Pulse-Atomic Force Nanolithography Parameters on 2.5D Nanostructures’ Morphology
title Investigation of the Effects of Pulse-Atomic Force Nanolithography Parameters on 2.5D Nanostructures’ Morphology
title_full Investigation of the Effects of Pulse-Atomic Force Nanolithography Parameters on 2.5D Nanostructures’ Morphology
title_fullStr Investigation of the Effects of Pulse-Atomic Force Nanolithography Parameters on 2.5D Nanostructures’ Morphology
title_full_unstemmed Investigation of the Effects of Pulse-Atomic Force Nanolithography Parameters on 2.5D Nanostructures’ Morphology
title_short Investigation of the Effects of Pulse-Atomic Force Nanolithography Parameters on 2.5D Nanostructures’ Morphology
title_sort investigation of the effects of pulse-atomic force nanolithography parameters on 2.5d nanostructures’ morphology
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9781517/
https://www.ncbi.nlm.nih.gov/pubmed/36558273
http://dx.doi.org/10.3390/nano12244421
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