Cargando…

Investigation into SiO(2) Etching Characteristics Using Fluorocarbon Capacitively Coupled Plasmas: Etching with Radical/Ion Flux-Controlled

SiO(2) etching characteristics were investigated in detail. Patterned SiO(2) was etched using radio-frequency capacitively coupled plasma with pulse modulation in a mixture of argon and fluorocarbon gases. Through plasma diagnostic techniques, plasma parameters (radical and electron density, self-bi...

Descripción completa

Detalles Bibliográficos
Autores principales:	Jeong, Won-nyoung, Lee, Young-seok, Cho, Chul-hee, Seong, In-ho, You, Shin-jae
Formato:	Online Artículo Texto
Lenguaje:	English
Publicado:	MDPI 2022
Materias:	Article
Acceso en línea:	https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9781520/ https://www.ncbi.nlm.nih.gov/pubmed/36558310 http://dx.doi.org/10.3390/nano12244457

Ejemplares similares

Characterization of SiO(2) Etching Profiles in Pulse-Modulated Capacitively Coupled Plasmas
por: Cho, Chulhee, et al.
Publicado: (2021)

Database Development of SiO(2) Etching with Fluorocarbon Plasmas Diluted with Various Noble Gases of Ar, Kr, and Xe
por: Lee, Youngseok, et al.
Publicado: (2022)

Contribution of Ion Energy and Flux on High-Aspect Ratio SiO(2) Etching Characteristics in a Dual-Frequency Capacitively Coupled Ar/C(4)F(8) Plasma: Individual Ion Energy and Flux Controlled
por: Jeong, Wonnyoung, et al.
Publicado: (2023)

Characterization of an Etch Profile at a Wafer Edge in Capacitively Coupled Plasma
por: Seong, Inho, et al.
Publicado: (2022)

Low-Temperature Plasma Diagnostics to Investigate the Process Window Shift in Plasma Etching of SiO(2)
por: Lee, Youngseok, et al.
Publicado: (2022)

Investigation of SiO(2) Etch Characteristics by C(6)F(6)/Ar/O(2) Plasmas Generated Using Inductively Coupled Plasma and Capacitively Coupled Plasma
por: Sung, Dain, et al.
Publicado: (2022)

On Relationships between Gas-Phase Chemistry and Reactive Ion Etching Kinetics for Silicon-Based Thin Films (SiC, SiO(2) and Si(x)N(y)) in Multi-Component Fluorocarbon Gas Mixtures
por: Efremov, Alexander, et al.
Publicado: (2021)

Infinite Selectivity of Wet SiO(2) Etching in Respect to Al
por: Gablech, Imrich, et al.
Publicado: (2020)

In Situ Study of the Wet Chemical Etching of SiO(2) and Nanoparticle@SiO(2) Core–Shell Nanospheres
por: Grau-Carbonell, Albert, et al.
Publicado: (2021)

Mechanistic Insight into Etching Chemistry and HF-Assisted Etching of MgO-Al(2)O(3)-SiO(2) Glass-Ceramic
por: Ji, Yanxin, et al.
Publicado: (2018)

Development of Virtual Metrology Using Plasma Information Variables to Predict Si Etch Profile Processed by SF(6)/O(2)/Ar Capacitively Coupled Plasma
por: Kwon, Ji-Won, et al.
Publicado: (2021)

A Review: Inductively Coupled Plasma Reactive Ion Etching of Silicon Carbide
por: Racka-Szmidt, Katarzyna, et al.
Publicado: (2021)

Monte Carlo simulation of nanoscale material focused ion beam gas-assisted etching: Ga(+) and Ne(+) etching of SiO(2) in the presence of a XeF(2) precursor gas
por: Mahady, Kyle T., et al.
Publicado: (2019)

High-temperature etching of SiC in SF(6)/O(2) inductively coupled plasma
por: Osipov, Artem A., et al.
Publicado: (2020)

Selective isotropic etching of SiO(2) over Si(3)N(4) using NF(3)/H(2) remote plasma and methanol vapor
por: Gil, Hong Seong, et al.
Publicado: (2023)

Enhancing the Plasma-Resistance Properties of Li(2)O–Al(2)O(3)–SiO(2) Glasses for the Semiconductor Etch Process via Alkaline Earth Oxide Incorporation
por: Kim, So-Won, et al.
Publicado: (2023)

Fabrication of Diamond Submicron Lenses and Cylinders by ICP Etching Technique with SiO(2) Balls Mask
por: Liu, Zongchen, et al.
Publicado: (2019)

Numerical Study of a Capacitive Graphene Oxide Humidity Sensor with Etched Configuration
por: Mohammedture, Meriam, et al.
Publicado: (2021)

Plasma properties, deposition and etching
por: Pouch, J J, et al.
Publicado: (1993)

Reduced Etch Lag and High Aspect Ratios by Deep Reactive Ion Etching (DRIE)
por: Gerlt, Michael S., et al.
Publicado: (2021)

Conformal SiO(2) coating of sub-100 nm diameter channels of polycarbonate etched ion-track channels by atomic layer deposition
por: Sobel, Nicolas, et al.
Publicado: (2015)

Curved Structure of Si by Improving Etching Direction Controllability in Magnetically Guided Metal-Assisted Chemical Etching
por: Kim, Tae Kyoung, et al.
Publicado: (2020)

Etched and non etched test Rutherford cable.
por: S. Horvath
Publicado: (2000)

Systematic Characterization of Plasma-Etched Trenches on 4H-SiC Wafers
por: Pirnaci, Massimo D., et al.
Publicado: (2021)

Electroless etching of Si with IO(3)(–) and related species
por: Kolasinski, Kurt W, et al.
Publicado: (2012)

Conical Nanotubes Synthesized by Atomic Layer Deposition of Al(2)O(3), TiO(2), and SiO(2) in Etched Ion-Track Nanochannels
por: Ulrich, Nils, et al.
Publicado: (2021)

Mechanism understanding in cryo atomic layer etching of SiO(2) based upon C(4)F(8) physisorption
por: Antoun, G., et al.
Publicado: (2021)

Nonlinear Etch Rate of Au-Assisted Chemical Etching of Silicon
por: Choi, Keorock, et al.
Publicado: (2017)

Deep Etching of Silicon Based on Metal-Assisted Chemical Etching
por: Nur’aini, Anafi, et al.
Publicado: (2022)

Plasma etching processes for CMOS devices realization
por: Posseme, Nicolas
Publicado: (2017)

Plasma etching processes for interconnect realization in VLSI
por: Posseme, Nicolas
Publicado: (2015)

Glow discharge processes: sputtering and plasma etching
por: Chapman, Brian N
Publicado: (1980)

Manipulation of the Superhydrophobicity of Plasma-Etched Polymer Nanostructures
por: Du, Ke, et al.
Publicado: (2018)

Wettability of polytetrafluoroethylene surfaces by plasma etching modifications
por: Kang, Hyomin, et al.
Publicado: (2023)

Fabrication of Submicron Beams with Galvanic Etch Stop for Si in TMAH
por: Lu, Rong, et al.
Publicado: (2009)

3D Patterning of Si by Contact Etching With Nanoporous Metals
por: Bastide, Stéphane, et al.
Publicado: (2019)

Etched p-Type Si Nanowires for Efficient Ozone Decomposition
por: Li, Xuan, et al.
Publicado: (2019)

Novel Method for Electroless Etching of 6H–SiC
por: Károlyházy, Gyula, et al.
Publicado: (2020)

Understanding the effect of HF-based wet shallow etching on optical performance of reactive-ion-etched fused silica optics
por: Sun, Laixi, et al.
Publicado: (2021)

Nanogrids and Beehive-Like Nanostructures Formed by Plasma Etching the Self-Organized SiGe Islands
por: Chang, Yuan-Ming, et al.
Publicado: (2010)

Cannot write session to /tmp/vufind_sessions/sess_9ov5t44oo97s112lpugvasdoj0