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AACVD of Cu(3)N on Al(2)O(3) Using CuCl(2) and NH(3)

Cu(3)N has been grown on m-Al(2)O(3) by aerosol-assisted chemical vapor deposition using 0.1 M CuCl(2) in CH(3)CH(2)OH under an excess of NH(3) at 600 °C, which led to the deposition of Cu that was subsequently converted into Cu(3)N under NH(3): O(2) at 400 °C in a two-step process without exposure...

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Detalles Bibliográficos
Autor principal: Zervos, Matthew
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2022
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9787788/
https://www.ncbi.nlm.nih.gov/pubmed/36556770
http://dx.doi.org/10.3390/ma15248966