Fabrication of wafer-scale nanoporous AlGaN-based deep ultraviolet distributed Bragg reflectors via one-step selective wet etching

In this paper, we reported on wafer-scale nanoporous (NP) AlGaN-based deep ultraviolet (DUV) distributed Bragg reflectors (DBRs) with 95% reflectivity at 280 nm, using epitaxial periodically stacked n-Al(0.62)Ga(0.38)N/u-Al(0.62)Ga(0.38)N structures grown on AlN/sapphire templates via metal–organic...

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Detalles Bibliográficos
Autores principales: Zhao, Yongming, Shan, Maocheng, Zheng, Zhihua, Jian, Pengcheng, Liu, WeiJie, Tan, Shizhou, Chen, Changqing, Wu, Feng, Dai, Jiangnan
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group UK 2022
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9794686/
https://www.ncbi.nlm.nih.gov/pubmed/36575216
http://dx.doi.org/10.1038/s41598-022-25712-2

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9794686/
https://www.ncbi.nlm.nih.gov/pubmed/36575216
http://dx.doi.org/10.1038/s41598-022-25712-2

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