Synthesis, Structure, and Thermal Properties of Volatile Group 11 Triazenides as Potential Precursors for Vapor Deposition

[Image: see text] Group 11 thin films are desirable as interconnects in microelectronics. Although many M–N-bonded Cu precursors have been explored for vapor deposition, there is currently a lack of suitable Ag and Au derivatives. Herein, we present monovalent Cu, Ag, and Au 1,3-di-tert-butyltriazen...

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Detalles Bibliográficos
Autores principales: Samii, Rouzbeh, Fransson, Anton, Mpofu, Pamburayi, Niiranen, Pentti, Ojamäe, Lars, Kessler, Vadim, O’Brien, Nathan J.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: American Chemical Society 2022
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9795554/
https://www.ncbi.nlm.nih.gov/pubmed/36516988
http://dx.doi.org/10.1021/acs.inorgchem.2c03071

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9795554/
https://www.ncbi.nlm.nih.gov/pubmed/36516988
http://dx.doi.org/10.1021/acs.inorgchem.2c03071

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