Synthesis, Structure, and Thermal Properties of Volatile Group 11 Triazenides as Potential Precursors for Vapor Deposition

[Image: see text] Group 11 thin films are desirable as interconnects in microelectronics. Although many M–N-bonded Cu precursors have been explored for vapor deposition, there is currently a lack of suitable Ag and Au derivatives. Herein, we present monovalent Cu, Ag, and Au 1,3-di-tert-butyltriazen...

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Autores principales: Samii, Rouzbeh, Fransson, Anton, Mpofu, Pamburayi, Niiranen, Pentti, Ojamäe, Lars, Kessler, Vadim, O’Brien, Nathan J.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: American Chemical Society 2022
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9795554/
https://www.ncbi.nlm.nih.gov/pubmed/36516988
http://dx.doi.org/10.1021/acs.inorgchem.2c03071
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author Samii, Rouzbeh
Fransson, Anton
Mpofu, Pamburayi
Niiranen, Pentti
Ojamäe, Lars
Kessler, Vadim
O’Brien, Nathan J.
author_facet Samii, Rouzbeh
Fransson, Anton
Mpofu, Pamburayi
Niiranen, Pentti
Ojamäe, Lars
Kessler, Vadim
O’Brien, Nathan J.
author_sort Samii, Rouzbeh
collection PubMed
description [Image: see text] Group 11 thin films are desirable as interconnects in microelectronics. Although many M–N-bonded Cu precursors have been explored for vapor deposition, there is currently a lack of suitable Ag and Au derivatives. Herein, we present monovalent Cu, Ag, and Au 1,3-di-tert-butyltriazenides that have potential for use in vapor deposition. Their thermal stability and volatility rival that of current state-of-the-art group 11 precursors with bidentate M–N-bonded ligands. Solution-state thermolysis of these triazenides yielded polycrystalline films of elemental Cu, Ag, and Au. The compounds are therefore highly promising as single-source precursors for vapor deposition of coinage metal films.
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spelling pubmed-97955542022-12-29 Synthesis, Structure, and Thermal Properties of Volatile Group 11 Triazenides as Potential Precursors for Vapor Deposition Samii, Rouzbeh Fransson, Anton Mpofu, Pamburayi Niiranen, Pentti Ojamäe, Lars Kessler, Vadim O’Brien, Nathan J. Inorg Chem [Image: see text] Group 11 thin films are desirable as interconnects in microelectronics. Although many M–N-bonded Cu precursors have been explored for vapor deposition, there is currently a lack of suitable Ag and Au derivatives. Herein, we present monovalent Cu, Ag, and Au 1,3-di-tert-butyltriazenides that have potential for use in vapor deposition. Their thermal stability and volatility rival that of current state-of-the-art group 11 precursors with bidentate M–N-bonded ligands. Solution-state thermolysis of these triazenides yielded polycrystalline films of elemental Cu, Ag, and Au. The compounds are therefore highly promising as single-source precursors for vapor deposition of coinage metal films. American Chemical Society 2022-12-14 2022-12-26 /pmc/articles/PMC9795554/ /pubmed/36516988 http://dx.doi.org/10.1021/acs.inorgchem.2c03071 Text en © 2022 The Authors. Published by American Chemical Society https://creativecommons.org/licenses/by/4.0/Permits the broadest form of re-use including for commercial purposes, provided that author attribution and integrity are maintained (https://creativecommons.org/licenses/by/4.0/).
spellingShingle Samii, Rouzbeh
Fransson, Anton
Mpofu, Pamburayi
Niiranen, Pentti
Ojamäe, Lars
Kessler, Vadim
O’Brien, Nathan J.
Synthesis, Structure, and Thermal Properties of Volatile Group 11 Triazenides as Potential Precursors for Vapor Deposition
title Synthesis, Structure, and Thermal Properties of Volatile Group 11 Triazenides as Potential Precursors for Vapor Deposition
title_full Synthesis, Structure, and Thermal Properties of Volatile Group 11 Triazenides as Potential Precursors for Vapor Deposition
title_fullStr Synthesis, Structure, and Thermal Properties of Volatile Group 11 Triazenides as Potential Precursors for Vapor Deposition
title_full_unstemmed Synthesis, Structure, and Thermal Properties of Volatile Group 11 Triazenides as Potential Precursors for Vapor Deposition
title_short Synthesis, Structure, and Thermal Properties of Volatile Group 11 Triazenides as Potential Precursors for Vapor Deposition
title_sort synthesis, structure, and thermal properties of volatile group 11 triazenides as potential precursors for vapor deposition
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9795554/
https://www.ncbi.nlm.nih.gov/pubmed/36516988
http://dx.doi.org/10.1021/acs.inorgchem.2c03071
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