Electrical and Structural Properties of Semi-Polar-ZnO/a-Al(2)O(3) and Polar-ZnO/c-Al(2)O(3) Films: A Comparative Study

In this work, the properties of ZnO films of 100 nm thickness, grown using atomic layer deposition (ALD) on a–(100) and c–(001) oriented Al(2)O(3) substrate are reported. The films were grown in the same growth conditions and parameters at six different growth temperatures (T(g)) ranging from 100 °C...

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Detalles Bibliográficos
Autores principales: Mishra, Sushma, Paszkowicz, Wojciech, Sulich, Adrian, Jakiela, Rafal, Ożga, Monika, Guziewicz, Elżbieta
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2022
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9821142/
https://www.ncbi.nlm.nih.gov/pubmed/36614490
http://dx.doi.org/10.3390/ma16010151

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9821142/
https://www.ncbi.nlm.nih.gov/pubmed/36614490
http://dx.doi.org/10.3390/ma16010151

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