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Electrical and Structural Properties of Semi-Polar-ZnO/a-Al(2)O(3) and Polar-ZnO/c-Al(2)O(3) Films: A Comparative Study
In this work, the properties of ZnO films of 100 nm thickness, grown using atomic layer deposition (ALD) on a–(100) and c–(001) oriented Al(2)O(3) substrate are reported. The films were grown in the same growth conditions and parameters at six different growth temperatures (T(g)) ranging from 100 °C...
Autores principales: | , , , , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
MDPI
2022
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9821142/ https://www.ncbi.nlm.nih.gov/pubmed/36614490 http://dx.doi.org/10.3390/ma16010151 |