Structure and Thermal Stability of ε/κ-Ga(2)O(3) Films Deposited by Liquid-Injection MOCVD

We report on crystal structure and thermal stability of epitaxial ε/κ-Ga(2)O(3) thin films grown by liquid-injection metal–organic chemical vapor deposition (LI-MOCVD). Si-doped Ga(2)O(3) films with a thickness of 120 nm and root mean square surface roughness of ~1 nm were grown using gallium-tetram...

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Detalles Bibliográficos
Autores principales: Dobročka, Edmund, Gucmann, Filip, Hušeková, Kristína, Nádaždy, Peter, Hrubišák, Fedor, Egyenes, Fridrich, Rosová, Alica, Mikolášek, Miroslav, Ťapajna, Milan
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2022
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9821604/
https://www.ncbi.nlm.nih.gov/pubmed/36614359
http://dx.doi.org/10.3390/ma16010020

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9821604/
https://www.ncbi.nlm.nih.gov/pubmed/36614359
http://dx.doi.org/10.3390/ma16010020

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