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Structure and Thermal Stability of ε/κ-Ga(2)O(3) Films Deposited by Liquid-Injection MOCVD
We report on crystal structure and thermal stability of epitaxial ε/κ-Ga(2)O(3) thin films grown by liquid-injection metal–organic chemical vapor deposition (LI-MOCVD). Si-doped Ga(2)O(3) films with a thickness of 120 nm and root mean square surface roughness of ~1 nm were grown using gallium-tetram...
Autores principales: | Dobročka, Edmund, Gucmann, Filip, Hušeková, Kristína, Nádaždy, Peter, Hrubišák, Fedor, Egyenes, Fridrich, Rosová, Alica, Mikolášek, Miroslav, Ťapajna, Milan |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
MDPI
2022
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9821604/ https://www.ncbi.nlm.nih.gov/pubmed/36614359 http://dx.doi.org/10.3390/ma16010020 |
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