Gap-directed chemical lift-off lithographic nanoarchitectonics for arbitrary sub-micrometer patterning

We introduce a unique soft lithographic operation that exploits stamp roof collapse-induced gaps to selectively remove an alkanethiol self-assembled monolayer (SAM) on Au to generate surface patterns that are orders of magnitude smaller than structures on the original elastomer stamp. The smallest a...

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Detalles Bibliográficos
Autores principales: Wang, Chang-Ming, Chan, Hong-Sheng, Liao, Chia-Li, Chang, Che-Wei, Liao, Wei-Ssu
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Beilstein-Institut 2023
Materias:
Full Research Paper
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9830500/
https://www.ncbi.nlm.nih.gov/pubmed/36703907
http://dx.doi.org/10.3762/bjnano.14.4

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9830500/
https://www.ncbi.nlm.nih.gov/pubmed/36703907
http://dx.doi.org/10.3762/bjnano.14.4

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