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Gap-directed chemical lift-off lithographic nanoarchitectonics for arbitrary sub-micrometer patterning
We introduce a unique soft lithographic operation that exploits stamp roof collapse-induced gaps to selectively remove an alkanethiol self-assembled monolayer (SAM) on Au to generate surface patterns that are orders of magnitude smaller than structures on the original elastomer stamp. The smallest a...
| Autores principales: | , , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
Beilstein-Institut
2023
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9830500/ https://www.ncbi.nlm.nih.gov/pubmed/36703907 http://dx.doi.org/10.3762/bjnano.14.4 |