Cargando…
Through-Silicon via Device Non-Destructive Defect Evaluation Using Ultra-High-Resolution Acoustic Microscopy System
In this study, an ultra-high-resolution acoustic microscopy system capable of non-destructively evaluating defects that may occur in thin film structures was fabricated. It is an integrated system of the control module, activation module, and data acquisition system, in which an integrated control s...
Autores principales: | Kim, Tae Hyeong, Kang, Dongchan, Kim, Jeong Nyeon, Park, Ik Keun |
---|---|
Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
MDPI
2023
|
Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC9860617/ https://www.ncbi.nlm.nih.gov/pubmed/36676597 http://dx.doi.org/10.3390/ma16020860 |
Ejemplares similares
-
Evaluation of Adhesion Properties of Thin Film Structure through Surface Acoustic Wave Dispersion Simulation
por: Choi, Yu Min, et al.
Publicado: (2022) -
Development of a High-Resolution Acoustic Sensor Based on ZnO Film Deposited by the RF Magnetron Sputtering Method
por: Kang, Dong-Chan, et al.
Publicado: (2021) -
Enhanced resolution and sensitivity acoustic-resolution photoacoustic microscopy with semi/unsupervised GANs
por: Le, Thanh Dat, et al.
Publicado: (2023) -
Surface acoustic wave photonic devices in silicon on insulator
por: Munk, Dvir, et al.
Publicado: (2019) -
High-Resolution Photoemission Study of Neutron-Induced Defects in Amorphous Hydrogenated Silicon Devices
por: Peverini, Francesca, et al.
Publicado: (2022)